Royce Deposition System

Position
Experimental facilities

About the facility 

The Royce Deposition System is a multi-chamber, multi-technique tool for thin film growth that is unique in the UK and Europe.  

The bespoke setup connects four deposition chambers, each tailored to a specific deposition method or class of material, to ultra-high vacuum (UHV) sample transfer chambers. This allows multi-layered composites with defined interfaces to be produced without the need to break vacuum between fabrication steps. 

This facility particularly supports the early-stage development of materials for next-generation electronic devices for computing and display technologies to enhance efficiency and reduce environmental impact.

This facility is part of the Henry Royce Institute and is funded by the Engineering and Physical Sciences Research Council.

Funding and access options

If you’re from another academic institution, a research technology organisation, or a UK-based SME, you may be able to access the Royce Deposition System through Royce’s equipment access schemes.

If you’re a researcher based at the University of Leeds, enquire to explore access options. If you’re a business, learn more about access options for our facilities.

Available equipment 

  • Preparation chamber, with ion miller and annealing stage. 
  • Topological insulator molecular beam epitaxy (MBE) chamber, designed for epitaxial growth of topological insulator, with four dual-filament effusion cells, a low temperature effusion cell, two valved corrosive-metal-cracker-cells and in-situ reflection high-energy electron diffraction (RHEED). 
  • Pulsed laser deposition chamber, designed for the growth of complex oxides, with multi-target stage, Kr-F 248nm pulsed laser and in-situ RHEED. 
  • Sputtering chamber, designed for depositing metal and oxide thin-films, including magnetic materials, with seven confocal direct current and radio frequency (DC-RF) magnetron sputter sources, off-axis sputter source for low-energy deposition and multiple process gases (argon, oxygen and nitrogen). 
  • Organics molecular beam epitaxy (MBE) chamber, designed for the growth of hybrid metal-organic heterostructures, with four low temperature effusion cells for evaporation of organic molecules, four pocket e-beam evaporation system and DC-RF magnetron sputtering source. 

Images

Two steel chambers with many valves and wires are connected by a cylindrical chamber,
The System's organics epitaxy chamber (left), connected to the pulsed laser deposition system (right) by the radial distribution chamber.
A close-up of the system, showing circular viewports, connections, pressure gauges and attached cabling.
The preparation chamber where a sample can be annealed or ion milled to prepare the surface before deposition.
Blue gloved hands position a circular sample holder inside into the System’s an open high‑vacuum deposition chamber, with stainless steel fittings, valves and connected tubing visible around the chamber.
A thin- film sample being loaded into the Deposition System's high-vacuum experimental chamber